%0 Conference Proceedings %T Effects of substrate roughness on Van Der Waals and electrostatic force contributions to particle adhesion %+ Department of Chemical and Biomolecular Engineering , Case Western Reserve University (CWRU) %+ Laboratoire de physique et de métrologie des aérosols (IRSN/PSN-RES/SCA/LPMA) %A Rajupet, Siddharth %A Riet, Adriaan %A Chen, Qizan %A Sow, Mamadou %A Lacks, Daniel J. %< avec comité de lecture %( 34ème Congrès Français sur les Aérosols %B CFA2021 - 34ème Congrès Français sur les Aérosols %C Paris, France %8 2021-01-26 %D 2021 %R 10.25576/ASFERA-CFA2021-24801 %K particle adhesion roughness electrostatics van der Waals %K particle adhesion %K roughness %K electrostatics %K van der Waals %Z Physics [physics]Conference papers %X We characterize the effect of substrate roughness on van der Waals and electrostatic particle adhesion forces using theoretical methods. We find that substrate roughness can enhance or diminish electrostatic adhesion by at maximum a factor of ~2 for the surfaces studied, but can attenuate van der Waals forces by several orders of magnitude. Thus, substrate roughness can change the dominant contribution to adhesion from van der Waals forces to electrostatic forces. %G English %2 https://irsn.hal.science/irsn-03945368/document %2 https://irsn.hal.science/irsn-03945368/file/Rajupet_CFA_2021%20VE.PDF %L irsn-03945368 %U https://irsn.hal.science/irsn-03945368 %~ IRSN %~ PSNRES %~ PSNRES-SCA